The influence of sputtering and transport mechanisms on target etching and thin film growth in rf systems—II. Transport and deposition processes
- 1 April 1972
- Vol. 22 (4) , 143-149
- https://doi.org/10.1016/0042-207x(72)90310-7
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
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