Enhanced Performance Of Optical Lithography Using The DESIRE System
- 20 August 1986
- conference paper
- Published by SPIE-Intl Soc Optical Eng
- Vol. 633, 262-269
- https://doi.org/10.1117/12.963730
Abstract
We report on the impact of the use of the DESIRE system in optical lithography. Results obtained with first and second generation resists are compared with the performance of the DESIRE system. This comparative study was done for scanning projection, lx stepper and reduction stepper equipment. The in-process compatibility of the new dry developed resist system is described. Thermal stability up to 300°C and good resistance to dry etching are reported. Also the impact of the addition of a color dye to the DESIRE-resin on the line-width control is demonstrated.© (1986) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.Keywords
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