Methods of Altering the Characteristics of a Multilayer Stack*†

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Abstract
The reflectance R of a multilayer stack is changed as either the thickness t or refractive index n of any of the films in the stack is altered. An efficient method of computing the first partial derivatives ∂R/∂t and ∂R/∂n is presented. An example is cited in which these derivatives are employed in a relaxation process which is utilized to improve the design of a multilayer containing absorbing films, which is used as a reflection filter in the vacuum-ultraviolet spectral region.

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