Abstract
We study the growth of GaN and (In,Ga)N/GaN multiple quantum wells on γ-LiAlO2 by rf plasma-assisted molecular beam epitaxy. The GaN layers exhibit promising optical and electrical properties, whereas the structural quality is significantly influenced by inferior substrate morphology. The (In,Ga)N/GaN multiple quantum well structures show intense room-temperature photoluminescence in the violet and blue spectral range.