Oxygen depth profiling by activation with the16O(3He, p,)18F reaction
- 1 March 1982
- journal article
- research article
- Published by Springer Nature in Journal of Radioanalytical and Nuclear Chemistry
- Vol. 70 (1-2) , 329-336
- https://doi.org/10.1007/bf02516121
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Oxygen diffusion in silicon and the influence of different dopantsJournal of Applied Physics, 1980
- Yield of 18F for various reactions from oxygen and neonThe International Journal of Applied Radiation and Isotopes, 1974
- A new radio-tracer technique for the evaporation study of light elements from molten siliconThe International Journal of Applied Radiation and Isotopes, 1971