Deposition of titania thin films from aqueous solution by a continuous flow technique

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Abstract
Organic self assembled monolayer (SAMs) on p-type silicon (001) single crystal wafers were used as substrates for the formation of TiO2 films from aqueous solution. It was previously shown that this organic modification allows the formation of homogeneous thin films of TiO2 below 100 °C under static conditions. The formation of a titanium complex in the presence of H2O2 is used to avoid the otherwise spontaneous precipitation of titania from the aqueous solution. In the present paper, the synthesis of TiO2 thin films is realized by a continuous flow method (cfm). In this method the silicon substrate is placed in a cylindrical reaction chamber, through which the solution is pumped with a constant flow rate. SEM, TEM, ellipsometry and XPS measurements illustrate that this technique allows deposition of thicker films than are obtained using a static deposition method, while achieving similar homogeneity. The films are crystalline and a uniform surface topography can be achieved.

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