Morphology of LPCVD Si3N4 films after high temperature treatment and HF etching
- 1 July 1995
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 187, 301-307
- https://doi.org/10.1016/0022-3093(95)00154-9
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Spatial charge distribution in as-deposited and UV-illuminated gate-quality nitrogen-rich silicon nitrideIEEE Electron Device Letters, 1989
- On the Nature of CVD Si‐Rich SiO2 and Si3 N 4 FilmsJournal of the Electrochemical Society, 1980