The Contribution of Multiple Vacancies to Self‐Diffusion

Abstract
The deviations from a straight line of an Arrhenius plot of self‐diffusion coefficients are discussed in terms of the contribution of multiple vacancies to self‐diffusion. It is shown that for nickel the major part of the curvature may be accounted for by di‐ and trivacancy contributions. A small residual curvature of the Arrhenius plot is possibly indicative of a temperature dependence of the activation entropies.