The morphological stability in supercritical fluid chemical deposition of films near the critical point
- 1 October 1995
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 155 (3-4) , 276-285
- https://doi.org/10.1016/0022-0248(95)00198-0
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Supercritical fluid transport-chemical deposition of filmsChemistry of Materials, 1992
- Chemical vapour deposition of copper on Si(111) and SiO2 substratesJournal of Crystal Growth, 1992
- Criteria for making uniform films by chemical vapor depositionJournal of Crystal Growth, 1992
- Kinetic model of morphological instabilities in chemical vapor depositionThin Solid Films, 1989
- Local equilibrium model of morphological instabilities in chemical vapor depositionThin Solid Films, 1988