Theoretical aspects for depth profiling by ARXPS
- 31 December 1990
- journal article
- Published by Elsevier in Journal of Electron Spectroscopy and Related Phenomena
- Vol. 52, 273-283
- https://doi.org/10.1016/0368-2048(90)85023-3
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Depth‐compositional analyses (angle‐resolved x‐ray photoelectron spectroscopy) of degradations on etched mercury cadmium tellurideJournal of Vacuum Science & Technology A, 1988
- Use of angle-dependent photoemission for atom profiling: Au on compound semiconductorsApplied Physics Letters, 1987
- The energy dependence of electron attenuation lengthsSurface and Interface Analysis, 1985
- Quantitative electron spectroscopy of surfaces: A standard data base for electron inelastic mean free paths in solidsSurface and Interface Analysis, 1979