The application of the in-situ dyeing effect to an image reversal resist
- 1 April 1990
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 11 (1-4) , 557-560
- https://doi.org/10.1016/0167-9317(90)90170-x
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Development of Positive PhotoresistsJournal of the Electrochemical Society, 1987
- Image reversal of positive photoresist: Characterization and modelingIEEE Transactions on Electron Devices, 1985
- Characterization of positive photoresistIEEE Transactions on Electron Devices, 1975