Microwave plasma chemical vapour deposition of high purity diamond films
- 1 March 1993
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 2 (2-4) , 402-406
- https://doi.org/10.1016/0925-9635(93)90091-f
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- A microbeam analytical characterization of diamond filmsDiamond and Related Materials, 1992
- Diamond Chemical Vapor DepositionAnnual Review of Physical Chemistry, 1991
- Towards a general concept of diamond chemical vapour depositionDiamond and Related Materials, 1991