The effect of fluorine on gate dielectric properties

• 1 January 1987
• proceedings article
• Published by Institute of Electrical and Electronics Engineers (IEEE)
• https://doi.org/10.1109/iedm.1987.191491

Abstract

Keywords

• STRESS TESTING
• CHEMICALS
• TESTING
• DIELECTRIC PROPERTIES
• STRESS
• BREAKDOWN VOLTAGE
• DIELECTRICS
• ION IMPLANTATION