Electron beam induced modification of GaAs surfaces for maskless thermal Cl2 etching

• 1 November 1990
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B
• Vol. 8  (6) , 1830-1835
• https://doi.org/10.1116/1.585168

Abstract

Keywords

• MODIFICATION
• BEAM INDUCED
• ELECTRON BEAM
• CL2 ETCHING
• THERMAL CL2
• MASKLESS THERMAL
• GAAS SURFACES