Amorphous hydrogenated carbon nitride films obtained by plasma-enhanced chemical vapour deposition
- 1 September 1995
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 74-75, 382-386
- https://doi.org/10.1016/0257-8972(95)08244-1
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Experimental Realization of the Covalent Solid Carbon NitrideScience, 1993
- Analytical electron microscopy and Raman spectroscopy studies of carbon nitride thin filmsJournal of Vacuum Science & Technology A, 1993
- Formation of Carbon Nitride Films by Means of Ion Assisted Dynamic Mixing (IVD) MethodJapanese Journal of Applied Physics, 1993
- Relationship between the structural organization and the physical properties of PECVD nitrogenated carbonsJournal of Materials Research, 1993
- Internal stress reduction by nitrogen incorporation in hard amorphous carbon thin filmsApplied Physics Letters, 1992
- Properties of nitrogen-doped amorphous hydrogenated carbon filmsJournal of Applied Physics, 1991
- Hard amorphous (diamond-like) carbonsProgress in Solid State Chemistry, 1991
- Prediction of New Low Compressibility SolidsScience, 1989
- Symmetry breaking in nitrogen-doped amorphous carbon: Infrared observation of the Raman-activeGandDbandsPhysical Review B, 1989
- Reactive sputtering of carbon and carbide targets in nitrogenJournal of Vacuum Science and Technology, 1979