Electron-Beam-Generated Holographic Masks For Optical Vector-Matrix Multiplication
- 1 February 1984
- journal article
- Published by SPIE-Intl Soc Optical Eng in Optical Engineering
- Vol. 23 (1) , 230179-230179-
- https://doi.org/10.1117/12.7973257
Abstract
A proposed optical vector-matrix multiplication scheme encodes the matrix elements as a holographic mask consisting of linear diffraction gratings. The binary, chrome-on-glass masks are fabricated by electron-beam lithography. This approach results in a fairly simple optical system that offers both large numerical range and high accuracy. Simple holographic masks have been fabricated and tested.Keywords
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