The Effects of Process‐Induced Defects on the Chemical Selectivity of Highly Doped Boron Etch Stops in Silicon
- 1 January 1994
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 141 (1) , 178-184
- https://doi.org/10.1149/1.2054680
Abstract
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