Plasma Etching Effect on Dangling Bonds and Nondiamond Components in Low- and High-Quality Diamond Films
- 1 April 1994
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 33 (4R) , 2035-2040
- https://doi.org/10.1143/jjap.33.2035
Abstract
Two types of diamond film with low and high quality are synthesized from a mixture of alcohol and hydrogen using microwave plasma chemical vapor deposition. Both films exhibit ESR spectra which can be decomposed into two signals with a broad and a narrow linewidth. The low-quality film has a spin density almost one order of magnitude higher for both the broad and narrow components than the high-quality film. The spin density for both the components greatly decreases upon microwave-plasma etching using CF4–O2gas. From the changes in ESR and Raman spectra induced by plasma etching, it is considered that both nondiamond and diamond phase in the film contain both the broad and narrow components, and that the former phase contains higher density of narrow components compared with the latter phase.Keywords
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