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The Microstructure Of High Dose Oxygen Implanted Si And Its Dependence On Implantation Conditions
Home
Publications
The Microstructure Of High Dose Oxygen Implanted Si And Its Dependence On Implantation Conditions
The Microstructure Of High Dose Oxygen Implanted Si And Its Dependence On Implantation Conditions
OH
O. W. Holland
O. W. Holland
DF
D. Fathy
D. Fathy
TS
T. P. Sjoreen
T. P. Sjoreen
JN
J. Narayan
J. Narayan
KM
K. More
K. More
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9 April 1985
proceedings article
Published by
SPIE-Intl Soc Optical Eng
https://doi.org/10.1117/12.946494
Abstract
No abstract available
Keywords
OXYGEN
MICROSTRUCTURES
SINGLE CRYSTAL
SILICON
CRYSTAL STRUCTURE
IONS
ION IMPLANTATION
SILICON ON INSULATOR
CRYSTALS
CHARGED PARTICLES
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Cited by 3 articles
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