In situ x-ray diffraction analysis of the C49–C54 titanium silicide phase transformation in narrow lines
- 3 April 1995
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 66 (14) , 1732-1734
- https://doi.org/10.1063/1.113349
Abstract
The transformation of titanium silicide from the C49 to the C54 structure was studied using x‐ray diffraction of samples containing arrays of narrow lines of preformed C49 TiSi2. Using a synchrotron x‐ray source, diffraction patterns were collected at 1.5–2 °C intervals during sample heating at rates of 3 or 20 °C/s to temperatures of 1000–1100 °C. The results show a monotonic increase in the C54 transition temperature by as much as 180 °C with a decreasing linewidth from 1.0 to 0.1 μm. Also observed is a monotonic increase in (040) preferred orientation of the C54 phase with decreasing linewidth. The results demonstrate the power of in situ x‐ray diffraction of narrow line arrays as a tool to study finite size effects in thin‐film reactions.Keywords
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