Enhanced UV imprint ability with a tri-layer stamp configuration
- 18 January 2005
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 78-79, 689-694
- https://doi.org/10.1016/j.mee.2004.12.086
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Step and flash imprint lithography: Template surface treatment and defect analysisJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000
- Step and flash imprint lithography: a new approach to high-resolution patterningPublished by SPIE-Intl Soc Optical Eng ,1999
- Nano-compact disks with 400 Gbit/in2 storage density fabricated using nanoimprint lithography and read with proximal probeApplied Physics Letters, 1997