A 29Si-NMR Investigation of Amorphous Hydrogenated Silicon Nitride
- 1 January 1986
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- The electronic properties of plasma-deposited films of hydrogenated amorphous SiNx (0<x<1.2)Journal of Applied Physics, 1986
- Principles of High Resolution NMR in SolidsPublished by Springer Nature ,1983
- Properties of Plasma‐Deposited Silicon NitrideJournal of the Electrochemical Society, 1979
- Characterization of Silicon Nitride FilmsJournal of the Electrochemical Society, 1971