Iron Oxide See-Through Photomasks
Open Access
- 1 January 1973
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 120 (4) , 545-550
- https://doi.org/10.1149/1.2403497
Abstract
The decomposition of in an oxidizing atmosphere was employed to obtain a film of 2600Aå thick on a glass substrate. Using standard photoresist technology with dilute as the etchant, see‐through photomasks with 1 µm patterned elements were obtained.Keywords
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