Low temperature dielectric films from octavinylsilsesquioxane
- 1 March 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 101 (4) , 373-376
- https://doi.org/10.1016/0040-6090(83)90104-9
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- The Preparation and Properties of Tin Oxide Films Formed by Oxidation of TetramethyltinJournal of the Electrochemical Society, 1976
- 979. Structural chemistry of the alkoxides. Part III. Secondary alkoxides of silicon, titanium, and zirconiumJournal of the Chemical Society, 1952