Continuous Discharge Line Source for the Extreme Ultraviolet
- 1 August 1971
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 10 (8) , 1904-1908
- https://doi.org/10.1364/ao.10.001904
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.Keywords
This publication has 6 references indexed in Scilit:
- Magnetoglow: A New Geophysical ResourceScience, 1971
- A far ultraviolet photometer for space researchPlanetary and Space Science, 1970
- Vacuum Ultraviolet Plasma Arc Radiation Source for the 300–1000-A Wavelength RegionApplied Optics, 1970
- Detection of Lyman-β and Helium Resonance Radiation in the Night SkyScience, 1968
- Improved Cathode for Extreme Ultraviolet Schueler LampApplied Optics, 1963
- Two Light Sources for Use in the Extreme UltravioletApplied Optics, 1962