Investigation of porous silicon formation during anodic treatment in aqueous HF
- 17 December 1979
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 64 (3) , 479-483
- https://doi.org/10.1016/0040-6090(79)90335-3
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Structure of Porous Silicon Layer and Heat‐Treatment EffectJournal of the Electrochemical Society, 1978
- Formation and Properties of Porous Silicon FilmJournal of the Electrochemical Society, 1977
- Formation and Properties of Porous Silicon and Its ApplicationJournal of the Electrochemical Society, 1975
- Etch Channel Formation during Anodic Dissolution of N-Type Silicon in Aqueous Hydrofluoric AcidJournal of the Electrochemical Society, 1972
- Electropolishing Silicon in Hydrofluoric Acid SolutionsJournal of the Electrochemical Society, 1958