Environmentally stable chemical amplification positive resist: principle, chemistry, contamination resistance, and lithographic feasibility.
- 1 January 1994
- journal article
- Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
- Vol. 7 (3) , 433-447
- https://doi.org/10.2494/photopolymer.7.433
Abstract
No abstract availableThis publication has 0 references indexed in Scilit: