Grey scale structures formation in SU-8 with e-beam and UV
- 14 February 2003
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 67-68 (1) , 306-311
- https://doi.org/10.1016/s0167-9317(03)00083-2
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Refractive micro lens array made of dichromate gelatin with gray-tone photolithographyMicroelectronic Engineering, 2001
- A simple new method for the investigation of process latitude in E-beam lithography with positive resistsMicroelectronic Engineering, 2000
- Use of SU-8 photoresist for very high aspect ratio x-ray lithographyMicroelectronic Engineering, 2000
- A new e-beam method for grey scale 3D optical elementsMicroelectronic Engineering, 1999
- Cost-effective mass fabrication of multilevel diffractive optical elements by use of a single optical exposure with a gray-scale mask on high-energy beam-sensitive glassApplied Optics, 1997
- Low energy electron beam lithography: Pattern distortion by charge trapped in the resistMicroelectronic Engineering, 1997
- Electron beam lithography using chemically-amplified resist: Resolution and profile controlMicroelectronic Engineering, 1996
- Investigation of structure profiles in negative resistsMicroelectronic Engineering, 1986