Adsorption, Absorption, and Degassing in the Oxygen-Niobium System at Very Low Pressure
Open Access
- 1 January 1967
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 114 (5) , 452-457
- https://doi.org/10.1149/1.2426626
Abstract
The interaction of low‐pressure oxygen with niobium has been investigated at temperatures between 300° to 2100°K. Four main kinetic patterns can be distinguished. At temperatures close to 300°K adsorption proceeds to the formation of a saturated surface layer. At intermediate temperatures (about 500°–800°K) a thin oxide layer is formed; simultaneously oxygen dissolves and diffuses into the metal. At higher temperatures (800°–170°K) oxygen dissolves rapidly and irreversibly; the observed kinetics can be explained by a surface mechanism involving two adsorption states. Finally, at very high temperatures (1700°K and higher) niobium oxides evaporate from an oxygen‐niobium solution. The kinetics of evaporation indicates that a mixture of and evolves, the composition of which shifts from the former to the latter with decreasing oxygen concentration.Keywords
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