UV laser photopolymerization of volatile surface-adsorbed methyl methacrylate
- 15 June 1983
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 42 (12) , 997-999
- https://doi.org/10.1063/1.93840
Abstract
The localized UV laser photopolymerization of surface-adsorbed methyl methacrylate has been used to deposit poly(methyl methacrylate) films for direct patterning of wet and dry chemical etching processes. Using this negative resist process, submicrometer linewidths both in the polymer deposition and in pattern transfer into Si and SiO2 have been demonstrated. The chemical kinetics of simple and catalyzed photopolymerization have been studied by dynamic lensing experiments and modeled as a dynamic equilibrium between competing surface photoreactions.Keywords
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