Ultra-shallow junction formation by excimer laser annealing and low energy (<1 keV) B implantation: A two-dimensional analysis
- 1 January 2002
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 186 (1-4) , 401-408
- https://doi.org/10.1016/s0168-583x(01)00887-4
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
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