Solid source MOCVD for the epitaxial growth of thin oxide films
Open Access
- 1 March 1993
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 128 (1-4) , 788-792
- https://doi.org/10.1016/s0022-0248(07)80045-5
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Single source MOCVD of epitaxial oxide thin filmsJournal of Crystal Growth, 1993
- Bi-epitaxial grain boundary junctions in YBa2Cu3O7Applied Physics Letters, 1991
- Single source metalorganic chemical vapor deposition of low microwave surface resistance YBa2Cu3O7Applied Physics Letters, 1991
- Low-temperature growth of MgO by molecular-beam epitaxyPhysical Review B, 1990