A KrF fast discharge laser in mixtures containing NF3, N2F4 or SF6
- 28 February 1977
- journal article
- Published by Elsevier in Optics Communications
- Vol. 20 (2) , 265-268
- https://doi.org/10.1016/0030-4018(77)90348-0
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Compact efficient discharge lasers in XeF, KrF and fluorineOptics Communications, 1976
- Performance of XeF/KrF lasers pumped by fast dischargesApplied Physics Letters, 1976
- High efficiency discharge excitation of the KrF laserOptics Communications, 1976
- Efficient electric discharge lasers in XeF and KrFApplied Physics Letters, 1976
- Fast-discharge-initiated KrF laserApplied Physics Letters, 1976
- High power uv noble-gas-halide laserfApplied Physics Letters, 1976
- High-efficiency KrF excimer laserApplied Physics Letters, 1976
- Electron-beam-controlled discharge pumping of the KrF laserApplied Physics Letters, 1975
- 100 MW, 248.4 nm, KrF laser excited by an electron beamOptics Communications, 1975
- Laser action on the 2Σ+1/2→2Σ+1/2 bands of KrF and XeClApplied Physics Letters, 1975