Improvement in 193 nm Photoresists Performance by 172 nm VUV Curing
- 1 January 2003
- journal article
- Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
- Vol. 16 (4) , 511-516
- https://doi.org/10.2494/photopolymer.16.511
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- Comparative study of resist stabilization techniques for metal etch processingPublished by SPIE-Intl Soc Optical Eng ,1999
- Improvement of Dry Etching Resistance of Resists by Deep UVCureJapanese Journal of Applied Physics, 1999