A New Apparatus for Cathodic Sputtering
- 1 June 1956
- journal article
- Published by Springer Nature in Nature
- Vol. 177 (4522) , 1229
- https://doi.org/10.1038/1771229a0
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- the properties of some reactively sputtered metal oxide filmsVacuum, 1953
- The distribution of thin films condensed on surfaces by the vacuum evaporation methodVacuum, 1952
- Transparent Conducting FilmsProceedings of the Physical Society. Section B, 1952