Sputter-initiated resonance ionization spectroscopy: A matrix-independent sub-parts-per-billion sensitive technique applied to diffusion studies in SiO2–InP interfaces
- 1 May 1990
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 8 (3) , 2318-2322
- https://doi.org/10.1116/1.576756