Hydrogen profiles of interfaces in amorphous silicon devices
- 1 December 1989
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 115 (1-3) , 75-77
- https://doi.org/10.1016/0022-3093(89)90365-7
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Hydrogen diffusion in amorphous siliconPhilosophical Magazine Part B, 1987
- Substitutional doping of photochemically-deposited amorphous hydrogenated siliconJournal of Applied Physics, 1984
- Surface states in P- and B-doped amorphous hydrogenated siliconPhysical Review B, 1983
- Use of nuclear reaction analysis to characterize the elemental composition and density of thin film amorphous siliconSolar Cells, 1980
- Vibrational spectroscopy of hydrogenated amorphous silicon alloysSolar Cells, 1980
- Hydrogen profiling in amorphous silicon films and p-n junctionsPhilosophical Magazine Part B, 1980