Electrical resistivity and structural changes in amorphous Ge1−xAlx thin films under thermal annealing
- 1 December 1988
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 167 (1-2) , 57-66
- https://doi.org/10.1016/0040-6090(88)90481-6
Abstract
No abstract availableKeywords
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