Diagnostics by optical emission spectroscopy in the vicinity of the substrate during magnetron sputtering of Ti

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Abstract
The spatial distribution of excited states for neutral Ti and Ar, as well as for ionized Ti, have been investigated in Ar discharges at 0.27 Pa, in the neighborhood of a grounded substrate, at variable temperatures θs (up to ∼500 °C), for given values of the magnetron current (up to 4 A). Pronounced local variations of excited states, with a maximum of spectral line intensities Iλ at ∼ 1 mm from the substrate, characterizing a fairly thin anode sheath, have been detected. The secondary electron emission from the anode is only weakly influenced by θs. The Iλ intensities increase with the power P, faster for Ti and Ti+ than for Ar: ITi∝P1.6, ITi+∝P2.3, and IAr∝P0.8.

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