Metalorganic chemical vapor deposition of tungsten nitride for advanced metallization

• 4 March 1996
• journal article
• Published by AIP Publishing in Applied Physics Letters
• Vol. 68  (10) , 1412-1414
• https://doi.org/10.1063/1.116097

Abstract

Keywords

• HIGH ASPECT RATIO
• THERMAL DECOMPOSITION
• THIN FILM DEPOSITION
• NITROGEN
• ELECTRIC CONDUCTIVITY
• FACE CENTERED CUBIC
• X RAY DIFFRACTION