Optical silicon lifetime measurements in heavily doped diffused regions
- 1 September 1977
- journal article
- Published by Institution of Engineering and Technology (IET) in Electronics Letters
- Vol. 13 (18) , 544-545
- https://doi.org/10.1049/el:19770391
Abstract
Monochromatic visible light at various wavelengths was used to generate photocurrent in a silicon n+-p diffused diode. A numerical model which includes electric field, heavy doping band gap reduction and doping level mobility dependence was used with fitting techniques to determine the carrier lifetime in the n+-region at each wavelength.Keywords
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