Reactions of Gallium Arsenide with Water Vapor and Hydrogen Chloride Gas
- 1 January 1964
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 111 (11) , 1248-1253
- https://doi.org/10.1149/1.2425970
Abstract
Thermal etching and deposition experiments on gallium arsenide using water vapor/hydrogen and hydrogen chloride/hydrogen as reaction gas mixtures have been performed. It will be shown that the experiments take place near thermodynamical equilibrium, although open tube systems are used. The thermodynamically calculated enthalpies of the respective reactions are in good agreement with the measured ones.Keywords
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