X-Ray study of the interface layer between low temperature deposited diamond film and the silicon substrate
- 31 March 1993
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 2 (2-4) , 575-579
- https://doi.org/10.1016/0925-9635(93)90124-k
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- The effect of oxygen in diamond deposition by microwave plasma enhanced chemical vapor depositionJournal of Materials Research, 1990
- Structural imperfections in CVD diamond filmsJournal of Materials Research, 1989
- Characterization of diamond thin films: Diamond phase identification, surface morphology, and defect structuresJournal of Materials Research, 1989
- I n s i t u characterization of diamond nucleation and growthApplied Physics Letters, 1989
- Effects of Oxygen on CVD Diamond SynthesisJapanese Journal of Applied Physics, 1987