rf-Sputtered Cadmium Sulfide “Thin Crystals”

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Abstract
Rf-sputtering techniques have been employed in a diode configuration for the deposition of cadmium sulfide films up to 5 mμ thickness on nonoriented substrates. X-ray diffractometer tracings showed exclusively (000l)peaks with l=2,4,6,⋯, indicating a highly preferred basal plane orientation parallel to the substrate. Electron diffraction patterns, moreover, indicate essentially the same structural features as those obtained from single crystal cadmium sulfide. Results based on x-ray double crystal spectrometry and electrical transport properties will be presented as related to sputtering parameters such as rf-power density, argon pressure, substrate temperature, and deposition rate.

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