Influence of deposition conditions and substrate structure on the structure of sputtered tellurium films
- 1 December 1974
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 24 (2) , 355-359
- https://doi.org/10.1016/0040-6090(74)90180-1
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Temperature Rise during Film Deposition by rf and dc SputteringJournal of Vacuum Science and Technology, 1972
- Structure, growth and orientation of vacuum deposited tellurium filmsThin Solid Films, 1971
- Structure and growth of oriented tellurium thin filmsThin Solid Films, 1971
- Thin film nucleation on ferroelectric substratesThin Solid Films, 1971
- Oriented Te thin filmsSolid-State Electronics, 1969