New trends on nitriding in low pressure arc discharges studied by optical emission spectroscopy
- 1 December 1996
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 86-87, 285-291
- https://doi.org/10.1016/s0257-8972(96)02952-0
Abstract
No abstract availableThis publication has 16 references indexed in Scilit:
- Progress in the analysis of the mechanisms of ion nitridingSurface and Coatings Technology, 1995
- Study of the ion energy distribution during physical vapour deposition of TiNSurface and Coatings Technology, 1994
- Some metal vapour ionization measurements in plasma beam evaporation systemsSurface and Coatings Technology, 1993
- An interface study of various PVD TiN coatings on plasma-nitrided austenitic stainless steel AISI 304Surface and Coatings Technology, 1993
- Surface modification of pure titanium and Ti6A14V by intensified plasma ion nitridingThin Solid Films, 1992
- Formation of aluminum nitride by intensified plasma ion nitridingJournal of Vacuum Science & Technology A, 1991
- Enhanced plasma nitriding at low pressures: A comparative study of d.c. and r.f. techniquesSurface and Coatings Technology, 1990
- Plasma activated physical vapour deposition (PAPVD) by hollow cathode arc (HCA)Vacuum, 1990
- Hard coatings by plasma-assisted PVD technologies: Industrial practiceSurface and Coatings Technology, 1989
- A new low pressure plasma nitriding methodThin Solid Films, 1982