Composition and Structure Characterization of WNx Films Produced by RF Reactive Sputtering

Publisher Website

1 January 1990

journal article
Published by Springer Nature in MRS Proceedings

Vol. 187
https://doi.org/10.1557/proc-187-161

Abstract

No abstract available

Keywords

This publication has 2 references indexed in Scilit:

Characterization of WN_x/GaAs Schottky Contacts Formed by Reactive RF Sputtering
Japanese Journal of Applied Physics, 1987
Characteristics of WN/GaAs Schottky Contacts Formed by Reactive RF Sputtering
Japanese Journal of Applied Physics, 1984