Short-gas-residence-time electron cyclotron resonance plasma etching

• 1 July 1994
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology A
• Vol. 12  (4) , 1209-1215
• https://doi.org/10.1116/1.579297

Abstract

Keywords

• RESIDENCE TIME
• PLASMA ETCHING
• ELECTRON CYCLOTRON RESONANCE