Pathways in device lithography
- 1 July 1975
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 22 (7) , 371-375
- https://doi.org/10.1109/T-ED.1975.18147
Abstract
A brief review is given of approaches to lithography for microdevice fabrication. Exposure systems in common use, as well as those in development, are described and assessed. These include contact and proximity printing, stationary and scanning projection printing, step-and-repeat reduction printing, scanning electron beam systems, electron imaging systems, and X-ray systems.Keywords
This publication has 1 reference indexed in Scilit:
- An electron imaging system for the fabrication of integrated circuitsSolid-State Electronics, 1969