Poly(olefin sulfones) have been shown to represent a new class of positive electron beam resists exhibiting sensitivities in the region of coulombs cm−2. Processing variables have been evaluated and exposure characteristics determined. These materials can be used in two development modes, (i) as a conventional solvent‐developed system and (ii) as a system which self develops during e‐beam irradiation by depolymerization followed by vaporization. Limitations of this “vapor development” process are discussed.